DAHIRU YA’U GITAL; MOH’D ADAMU SULE; ABBAS ADAMU, SANUSI MOHAMMED; KABIRU A. SAIDU; BUBA KARI JODA. Study of Impact of HfO2 gate oxide on the Electrical Characteristics of Nanowire Junction less Transistor. International Journal of Advances in Scientific Research and Engineering (IJASRE), ISSN:2454-8006, DOI: 10.31695/IJASRE, [S. l.], v. 8, n. 11, p. 62–67, 2022. DOI: 10.31695/IJASRE.2022.8.11.7. Disponível em: https://ijasre.net/index.php/ijasre/article/view/1630. Acesso em: 19 apr. 2024.