Experimental Study on Effects of Film Thickness on Structural Characteristics of ITO Thin Film Prepared by RF Sputtering

Authors

  • SULU H.T Umaru Ali Shinkafi Polytechnic Sokoto, Nigeria
  • MOREH A.U Usmanu Danfodio University Sokoto, Nigeria
  • Iliyasu M.I Usmanu Danfodio University Sokoto, Nigeria
  • Abubakar M.B Umaru Ali Shinkafi Polytechnic Sokoto, Nigeria
  • Aina A.O Usmanu Danfodio University Sokoto, Nigeria
  • MUSTAPHA K. A Usmanu Danfodio University Sokoto, Nigeria
  • Sulyman. A Federal College of Wildlife Management, New Bussa, Nigeria

DOI:

https://doi.org/10.31695/IJASRE.2021.34107

Keywords:

ITO, Corning Glass, RF Sputtering, Annealing

Abstract

This paper presents the effects of low-temperature annealing and film thickness on the structural characteristics of ITO thin film for photovoltaic applications. The thin film of thickness 40nm, 60nm, and 85nm were grown on glass substrate using radio frequency magnetron sputtering technique followed by thermal annealing at 4500C. These as-grown and annealed films were subjected to X-ray diffraction [XRD] for structural analysis. The  XRD patterns reveal that all as-grown samples are amorphous in nature in minor peaks. While the annealed samples are crystalline in nature with pronounced peaks at a preferred orientation [222] and monocrystalline in nature. This study shows that ITO thin films may be used as alternative materials for eco-friendly buffer layer thin-film solar cell applications.

References

Prest, J. [1979]: Energy for a Technological Society. Principles, Problems, Alternatives. Second Edition. Addition-Wesley Publishing Company, United States

Renewable Energy World [1999]: Energy Information Administration Washington DC, US Department of Energy.

World Energy Outlook [2004]: US Energy information and administration

Hendrik, F. [2010]: Experimental Study of Cu2ZnSnS4 thin films for solar cells. Department of Engineering Sciences Uppsala University

Zeynep, D.E. [2011]: Production of Amorphous silicon/p-type crystalline silicon. Heterojunction solar cells by sputtering and PECVD methods; A thesis submitted to the graduate school of National and Applied Sciences, Middle East Technical University.

Schultz, O., Fraunhofer, I. and Freibung, G. [2007]: A mette Q-Cells AG Ttalhelm Silicon, Solar cells with Screen –printed frontside. Met realization Exceeding 19% efficiency. In 22nd European photovoltaic solar Energy Conference and Exhibition, Milano Italy.

Kelvin ,J. E. [2009]: Fabrication and characterization of a quantum dot sensitized solar cell, an unpublished M.Sc in Physics submitted to the Faculty of the graduate school of Vanderbilt University

Kim, H., Gilmore, C., Pique, A., Horwitz, J., Mantoussi, H., Kafafi, Z. and Chrisey, D. [2010]: Electrical, optical and structural properties of indium-tin-oxide thin films for organic light-emitting devices.

Forat, H. A., Naser, M. A. and . Matjafri, M.Z [2014]: Effect of varying film thickness on the properties of Indium tin oxide films after temperature annealing. An International Journal of Enhanced Research in Science Technology & Engineering, ISSN: 2319-7463 Vol. 3 pp 443-446

Shih-Hao, C., Meng, C., Li, Hung-Sen, W., Sheng-Hui, C. and Chien-Cheng, K. [2015]: The effect of Annealing on nanothick Indium tin oxide transparent conductive films for touch sensors

Yalan, H., Xungang, D., Cong, W., Weichang, H. and Tianmin, W. [2004]: Effects of heat treatment on properties of ITO films prepared by rf magnetron sputtering. Center of Materials Physics and Chemistry, School of Science, Beijing University of Aeronautics and Astronautics Beijing 100083, People’s Republic of China

Almaraj, P. A. and Maan, A. [2016]: Effect of film thickness on sputtering power on properties of ITO thin films deposited by RF magnetron sputtering without oxygen. J Mster Sci: Mater electron 27:1006411071DOI 10.1007/s1084-016-5223-9

Downloads

How to Cite

SULU H.T, MOREH A.U, Iliyasu M.I, Abubakar M.B, Aina A.O, MUSTAPHA K. A, & Sulyman. A. (2021). Experimental Study on Effects of Film Thickness on Structural Characteristics of ITO Thin Film Prepared by RF Sputtering . International Journal of Advances in Scientific Research and Engineering (IJASRE), ISSN:2454-8006, DOI: 10.31695/IJASRE, 7(12), 1–8. https://doi.org/10.31695/IJASRE.2021.34107

Issue

Vol. 7 No. 12: IJASRE Dec-2021

Section

Articles

License

Copyright (c) 2021 SULU H.T, MOREH A.U, Iliyasu M.I, Abubakar M.B, Aina A.O, MUSTAPHA K. A, Sulyman. A

Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.