Experimental Study on Effects of Film Thickness on Structural Characteristics of ITO Thin Film Prepared by RF Sputtering
DOI:
https://doi.org/10.31695/IJASRE.2021.34107Keywords:
ITO, Corning Glass, RF Sputtering, AnnealingAbstract
This paper presents the effects of low-temperature annealing and film thickness on the structural characteristics of ITO thin film for photovoltaic applications. The thin film of thickness 40nm, 60nm, and 85nm were grown on glass substrate using radio frequency magnetron sputtering technique followed by thermal annealing at 4500C. These as-grown and annealed films were subjected to X-ray diffraction [XRD] for structural analysis. The XRD patterns reveal that all as-grown samples are amorphous in nature in minor peaks. While the annealed samples are crystalline in nature with pronounced peaks at a preferred orientation [222] and monocrystalline in nature. This study shows that ITO thin films may be used as alternative materials for eco-friendly buffer layer thin-film solar cell applications.
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Copyright (c) 2021 SULU H.T, MOREH A.U, Iliyasu M.I, Abubakar M.B, Aina A.O, MUSTAPHA K. A, Sulyman. A
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